Device for mounting an optical element, particularly a lens in an objective
OwnerJohannes Rauinventor
Life of this patent
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Abstract
In the case of a device for mounting a lens or a mirror in an objective, particularly a microlithography projection objective for producing semiconductor elements, the lens or the mirror is connected to a mount directly or via an intermediate element by means of a number of bearing elements. A number of bearing locations are provided on the lens or the mirror or the intermediate element. In each case two bearing locations are respectively connected via connecting points to the two ends of a balance beam of a first series of balance beams. The first series of balance beams is arranged so as to yield at least three articulation points for fastening on the mount.
Claims26
A device for mounting a lens or a mirror in an objective, particularly a microlithography projection objective for producing semiconductor elements, the lens or the mirror being connected to a mount directly or via an intermediate element by means of a number of bearing elements, a number of bearing locations being provided on the lens or the mirror or the intermediate element, in each case two bearing locations being respectively connected via connecting points to the two ends of a balance beam of a first series of balance beams, the first series of balance beams being arranged so as to yield at least three articulation points for fastening on the mount.
A device for mounting an optical element in a microlithography projection objective for producing semiconductor elements, the optical element being connected to a mount directly or via an intermediate element by means of a number of bearing elements, a number of bearing locations acting on the optical element, in each case two bearing locations being connected via an articulated connecting point to the two ends of a balance beam of a first series of balance beams, the first series of balance beams being arranged so as to yield at least three articulation points for fastening on the mount.
A microlithography projection objective for producing semiconductor elements, comprising at least one lens or a mirror, the at least one lens or the mirror being connected to a mount directly or via an intermediate element by means of a number of bearing elements, a number of bearing locations being provided on the lens or the mirror or the intermediate element, in each case two bearing locations being respectively connected via connecting points to the two ends of a balance beam of a first series of balance beams, the first series of balance beams being arranged so as to yield at least three articulation points for fastening on the mount.
An isostatically held optical element in a microlithography projection exposure machine, having a mount and having at least two carrier elements for connecting the mount to the optical element, each carrier element having at least one first series of balance beams with at least two two-sided levers of which the first lever is held rotatively on a lever arm of the second lever and is connected with its two lever arms to the optical element or with at least one of its lever arms to a further two-sided lever for the purpose of connection to the optical element, and the optical element or a further two-sided lever is connected to the other lever arm of the second lever for the purpose of connection to the optical element, the second lever being held rotatively on the mount or a second series of balance beams for connection to the mount, the second series of balance beams having at least two two-sided levers in a way corresponding to the first one, of which the first lever of the second series of balance beams is held rotatively on a lever arm of the second lever of the second series of balance beams, and is connected with its two lever arms to the mount, or with at least one lever arm to a further two-sided lever for connection to the mount, and the mount or a further two-sided lever being connected to the other lever arm of the second lever of the second series of balance beams for connection to the mount.
An isostatically held optical element in a microlithography projection exposure machine, having a mount and having at least two carrier elements for connecting the mount to the optical element, each carrier element having at least one first series of balance beams with at least two two-sided levers of which the first lever is held rotatively on a lever arm of the second lever and is connected with its two lever arms to the optical element, or with in each case one of its lever arms to a further two-sided lever for the purpose of connection to the optical element, and at least one further two-sided lever is connected to the other lever arm of the second lever for connection to the optical element, the second lever being held rotatively on the mount.
An optical element in a microlithography projection exposure machine, having a mount and having at least one carrier element for connecting the mount to the optical element, the carrier element having at least one first series of balance beams with at least two two-sided levers of which the first lever is held rotatively on a lever arm of the second lever and is connected with its two lever arms to the optical element or with in each case one of its lever arms to a further two-sided lever for the purpose of connection to the optical element, and at least one further two-sided lever being connected to the other lever arm of the second lever for the purpose of connection to the optical element, the second lever being held rotatively on a second series of balance beams for connection to the mount, the second series of balance beams having at least two two-sided levers in a way corresponding to the first one, of which the first lever of the second series of balance beams is held rotatively on a lever arm of the second lever of the second series of balance beams, and is connected with its two lever arms to the mount, or with at least one lever arm to a further two-sided lever for connection to the mount, and at least one further two-sided lever is connected to the other lever arm of the second lever of the second series of balance beams for connection to the mount.
An optical element in a microlithography projection exposure machine, having a mount and having at least one carrier element for connecting the mount to the optical element, the carrier element having at least one first series of balance beams with at least two two-sided levers of which the first lever is held rotatively on a lever arm of the second lever and is connected with its two lever arms to the optical element or with at least one of its lever arms to a further two-sided lever for the purpose of connection to the optical element, and the optical element is connected to the other lever arm of the second lever, the second lever being held rotatively on the mount.
Stress-poor, preferably isostatic mounting of an optical element in a microlithography projection exposure machine, having a mount and having at least two carrier elements for connecting the mount to the optical element, each carrier element having at least two two-sided levers with lever arms, at least one lever arm of a two-sided lever of the carrier element being connected with at least one of its lever arms to the fulcrum of a further lever of the carrier element, at least two lever arms of the levers of the carrier element being connected to the optical element, and a lever of the carrier element having an articulation point on the mount.
An isostatically held optical element that is connected to a mount, in particular an optical element in a microlithography projection exposure machine, more than three bearing locations being provided on the optical element for mounting in the mount.
Dependencies are inferred from the claim text.