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US 2006/0187439 A1Published application
Stage system including fine-motion cable unit, exposure apparatus, and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorNobushige Korenaga
Life of this patent
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Abstract
A stage system that reduces disturbances caused by deformation of a cable and achieves high-precision positioning. The stage system includes a substrate stage movable in at least two axial directions, a fine-motion cable unit that holds a cable and finely moves in at least two axial directions, and a coarse-motion cable unit that coarsely moves the fine-motion cable unit in at least one axial direction.
Claims43
A stage system comprising:
- a substrate stage movable in at least two axial directions;
- a fine-motion cable unit for holding a cable connected to the substrate stage, the fine-motion cable unit being movable in a short stroke in at least two axial directions;
- and
- a coarse-motion cable unit for moving the fine-motion cable unit in a long stroke in at least one axial direction.
1 more element
A stage system comprising:
- a coarse-motion stage movable in a long stroke;
- first and second fine-motion stages movable in a short stroke on the coarse-motion stage;
- and
- a cable connected to the first fine-motion stage,
- wherein the second fine-motion stage holds the cable.
2 more elements
(canceled)
(canceled)
An exposure apparatus for performing positioning on a substrate, said exposure apparatus comprising:
- a stage system including:
- (i) a substrate stage movable in at least two axial directions;
- (ii) a fine-motion cable unit for holding a cable connected to the substrate stage, the fine-motion cable unit being movable in a short stroke in at least two axial directions;
- and
- (iii) a coarse-motion cable unit for moving the fine-motion cable unit in a long stroke in at least one axial direction;
- and
- a projection system for projecting an image of a reticle onto a substrate.
4 more elements
A method of manufacturing a device comprising:
- performing positioning on a substrate using an exposure apparatus, the exposure apparatus including a stage system, the stage system having (i) a substrate stage movable in at least two axial directions, (ii) a fine-motion cable unit movable in a short stroke in at least two axial directions, and (iii) a coarse-motion cable unit for moving the fine-motion cable unit in a long stroke in at least one axial direction;
- and
- projecting an image of a reticle onto a substrate in order to manufacture a device.
Dependencies are inferred from the claim text.