Measuring apparatus and exposure apparatus having the same
AssigneeCanon Kabushiki Kaisha
InventorYumiko Ohsaki
Life of this patent
Estimating the term…
Abstract
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus includes a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less, and a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.
Claims14
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus comprising:
- a numerical aperture decreasing part for decreasing the numerical aperture of a light exited from the optical system under test to 0.6 or less;
- and
- a detector for detecting an interference fringes formed by the light that passes through the numerical aperture decreasing part.
A measuring apparatus for measuring an optical performance of an optical system under test that has a numerical aperture of more than 0.6 at a light exit side, said measuring apparatus comprising:
- a substrate for interference measurement that is used for the numerical aperture of 0.6 or less of a light exited from the optical system under test, and includes a first pattern that has a first pitch, and a second pattern that has a second pitch, the second pitch corresponding to the numerical aperture of more than 0.6 of the light exited from the optical system under test and being narrower than the first pitch;
- and
- a detector for detecting an interference fringes formed by the light,
- wherein said measuring apparatus combines results of plural measurements, using the first pattern and the second pattern.
Dependencies are inferred from the claim text.