Exposure apparatus, exposure method, method for manufacturing device

An exposure method of:

• forming a liquid immersion region by supplying liquid between a projection optical system and a substrate;
• projecting pattern images onto the substrate via the liquid and the projection optical system;
• and exposing the substrate, the method comprising:
• flowing the liquid;
• and
• supplying at least a portion of the flowing liquid to the substrate.

An exposure apparatus that:

• projects pattern images onto a substrate via a liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate;
• and exposes the substrate, the apparatus comprising:
• a liquid-supplying-section that supplies the liquid onto the substrate;
• a first pipe section that introduces the liquid to the liquid-supplying-section;
• and
• a second pipe section that is disposed around the first pipe section.

An exposure apparatus that:

• projects pattern images onto a substrate via a liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate;
• and exposes the substrate, the apparatus comprising:
• a liquid-supplying-section that supplies the liquid onto the substrate;
• a pipe section that introduces the liquid to the liquid-supplying-section, wherein at least a part of the pipe section comprises a double pipe formed by an inner pipe and a outer pipe disposed around the inner pipe.