Semiconductor apparatus and fabrication method of the same
AssigneeSemiconductor Energy Laboratory Co., Ltd., a Japan corporation
InventorsShunpei Yamazaki, Toru Takayama, Junya Maruyama, Yumiko Ohno
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AssigneeSemiconductor Energy Laboratory Co., Ltd., a Japan corporation
InventorsShunpei Yamazaki, Toru Takayama, Junya Maruyama, Yumiko Ohno
Estimating the term…
It is an object of the present invention to provide a semiconductor device capable of preventing deterioration due to penetration of moisture or oxygen, for example, a light-emitting apparatus having an organic light-emitting device that is formed over a plastic substrate, and a liquid crystal display apparatus using a plastic substrate. According to the present invention, devices formed on a glass substrate or a quartz substrate (a TFT, a light-emitting device having an organic compound, a liquid crystal device, a memory device, a thin-film diode, a pin-junction silicon photoelectric converter, a silicon resistance element, or the like) are separated from the substrate, and transferred to a plastic substrate having high thermal conductivity.
A semiconductor apparatus comprising:
8-24. (canceled)
A semiconductor apparatus comprising:
A semiconductor apparatus comprising:
Dependencies are inferred from the claim text.