Substrate processing system

A substrate processing system, comprising:

• a gas processing apparatus for processing a substrate by using a processing gas;
• a measuring apparatus for performing a measurement on the substrate processed in the gas processing apparatus;
• and
• a transfer apparatus for transferring the substrate processed in the gas processing apparatus to the measuring apparatus, all the apparatus being integrated in the system as a single unit,
• wherein the measuring apparatus includes a mounting unit for mounting the substrate;
• an optical measuring unit for performing a measurement on the substrate mounted on the mounting unit by irradiating a light beam thereto;
• and a measuring space having therein the mounting unit, in which the measurement is conducted on the substrate mounted on the mounting unit,
• wherein, in the measuring space, there is opened a substrate transfer port for transferring the substrate to the mounting unit by the transfer apparatus, and
• wherein the measuring space and a space where the optical measuring unit is accommodated are airtightly isolated from each other by a wall defining the corresponding measuring space.