Film precursor evaporation system and method of using

A deposition system for forming a thin film on a substrate comprising:

• a process chamber having a substrate holder configured to support said substrate and heat said substrate, a vapor distribution system configured to introduce film precursor vapor above said substrate, and a pumping system configured to evacuate said process chamber;
• a film precursor evaporation system configured to evaporate a film precursor, and to transport said film precursor vapor in a carrier gas, wherein said film precursor evaporation system comprises:
• a container comprising an outer wall and a bottom, said container configured to be coupled to a heater and heated to an elevated temperature;
• a lid configured to be sealably coupled to said container, said lid comprising an outlet configured to be sealably coupled to said thin film deposition system;
• a tray stack comprising:
• one or more trays including a first tray supported in said container and one or more optional additional trays configured to be positioned on one of said first tray or a preceding additional tray, each of said one or more trays having an inner tray wall with a support edge for supporting one of said optional additional trays and an outer tray wall, the inner and outer tray walls configured to retain said film precursor therebetween, and said inner tray walls defining a central flow channel in said container configured to be coupled to a carrier gas supply system to supply a carrier gas to said central flow channel;
• an annular space between said outer tray walls of said tray stack and said outer wall of said container, said annular space configured to be coupled to said outlet in said lid;
• one or more openings positioned in said inner tray walls of said tray stack and coupled to said central flow channel, and configured to flow carrier gas from said central flow channel, over said film precursor towards said annular space, and to exhaust said carrier gas through said outlet in said lid with film precursor vapor;
• and
• a vapor delivery system having a first end sealably coupled to said outlet of said film precursor evaporation system and a second end sealably coupled to an inlet of said vapor distribution system of said process chamber.

A film precursor evaporation system configured to be coupled to a thin film deposition system, comprising:

• a container comprising an outlet configured to be sealably coupled to said thin film deposition system and an inlet configured to be sealably coupled to a carrier gas supply system;
• and
• a tray stack comprising a plurality of trays configured to be received within said container, and configured to support and evaporate a precursor material in each of said plurality of trays to form a precursor vapor,
• wherein said container comprises a carrier gas supply space configured to receive a flow of said carrier gas through said inlet and introduce a portion of said flow of said carrier gas to said precursor material in each of said plurality of trays through one or more orifices in each of said plurality of trays, and
• wherein each of said portions of said flow of said carrier gas over said precursor material are collectively received with said precursor vapor in an evaporation exhaust space pneumatically coupled to said outlet.