Plasma display panel and manufacturing method of the same
AssigneeFujitsu Hitachi Plasma Display Limited
InventorsToshiyuki Nanto, Hideki Harada
Life of this patent
Estimating the term…
Abstract
The manufacturing method includes the step of forming a dielectric layer on a substrate where electrodes are formed so as to coat the electrodes in accordance with a vapor phase growth method, the step of carrying out a process for planarization on the dielectric layer, and the step of forming a protective film on the dielectric layer.
Claims10
A manufacturing method for an AC type plasma display panel, where electrodes provided on a substrate are coated with a dielectric layer, comprising the steps of:
- forming a dielectric layer on a substrate where electrodes are formed so as to coat the electrodes in accordance with a vapor phase growth method;
- carrying out a process for planarization on the dielectric layer;
- and
- forming a protective film on the dielectric layer.
An AC type plasma display panel having a dielectric layer for coating electrodes provided on a substrate and a protective film for coating the dielectric layer, wherein at least one layer, which is a portion of the dielectric layer, is formed in accordance with a vapor phase growth method, and the dielectric layer is approximately flat along the plane of the substrate, irrespectively of the unevenness of the electrodes in the lower layer.
Dependencies are inferred from the claim text.