Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsArjen Boogaard, Timotheus Sengers, Wilhelmus Sebastianus Maria Ketelaars, Carolus Spee
Life of this patent
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Abstract
A coating for sensors and/or parts of an exposure apparatus, for example a sensor on a substrate table of a lithography apparatus, include a semiconductor, a photocatalyst, and/or a metal oxide.
Claims28
An exposure apparatus, comprising:
- a radiation system configured to supply a beam of radiation;
- a patterning device configured to pattern the beam of radiation according to a desired pattern;
- a substrate table configured to support a substrate;
- a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein at least part of the substrate table is coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.
A device manufacturing method, comprising:
- supporting a substrate on a substrate table, at least part of the substrate table being coated with a coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof;
- and
- projecting a patterned beam of radiation onto a target portion of the substrate.
An immersion lithography apparatus comprising a substrate table, at least part of the substrate table having a coating, the coating having a hydrophilicity such that the coating has a water contact angle of less than about 10°.
A lithography apparatus comprising a part having a photocatalytic coating, the lithography apparatus being an extreme ultraviolet lithography apparatus or an immersion lithography apparatus.
A device manufacturing method, comprising:
- exposing a substrate to a patterned beam of radiation from an exposure apparatus comprising a part having a photocatalytic coating.
Dependencies are inferred from the claim text.