Substrate processing apparatus

A substrate processing apparatus that is arranged adjacent to an exposure device, comprising:

• a processing section for applying processing to a substrate;
• and
• an interface that is provided on one end of said processing section for exchanging the substrate between said processing section and said exposure device, wherein
• said processing section includes:
• a first processing block that includes a first processing unit that forms a photosensitive film made of photosensitive material, a first thermal processing unit that thermally treats the substrate, and a first transport unit that transports the substrate;
• a second processing block that includes a second processing unit that applies a development processing to the substrate after the exposure processing by said exposure device, a second thermal processing unit that thermally treats the substrate, and a second transport unit that transports the substrate;
• and
• a third processing block that includes a third processing unit that washes the substrate after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device, and a third transport unit that transports the substrate.