Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program

A deflection amplifier comprising:

• a first storage section which stores shot information at a drawing time;
• a second storage section which stores a correction table indicating a relation between the shot information and an output voltage;
• and
• an adjusting section which adjusts an output based on the correction table stored in the second storage section and the shot information stored in the first storage section.

An electron beam drawing apparatus comprising:

• at least one stage of a deflection amplifier and a deflection unit;
• a temperature sensor disposed in the deflection amplifier;
• a first storage section which stores temperature information of the temperature sensor;
• a second storage section which stores a correction table indicating a relation between a temperature of the deflection amplifier and an output voltage of the deflection amplifier;
• and
• an adjusting section which adjusts an output of the deflection amplifier based on a correction table stored in the second storage section and the temperature information stored in the first storage section.

A deflection amplifier comprising:

• a temperature sensor disposed in a main internal component;
• a first storage section which stores temperature information of the temperature sensor;
• a second storage section which stores a correction table indicating a relation between an internal temperature and an output voltage;
• and
• an adjusting section which adjusts an output based on the correction table stored in the second storage section and the temperature information stored in the first storage section.

An electron beam drawing apparatus comprising:

• at least one stage of a deflection amplifier and a deflection unit;
• a stage on which a sample is placed;
• a temperature sensor disposed on the stage;
• a first storage section which stores temperature information of the temperature sensor;
• a second storage section which stores a correction table indicating a relation between a temperature of the stage and an output voltage of the deflection amplifier;
• and
• an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the temperature information stored in the first storage section.

An electron beam drawing apparatus comprising:

• at least one stage of a deflection amplifier and a deflection unit;
• a stage on which a sample is placed;
• a temperature sensor disposed on the stage;
• a first storage section which stores temperature information of the temperature sensor;
• a second storage section which stores a correction table indicating a relation between a temperature of the stage and a position of the stage;
• and
• an adjusting section which adjusts the position of the stage based on the correction table stored in the second storage section and the temperature information stored in the first storage section.

An electron beam drawing apparatus comprising:

• at least one stage of a deflection amplifier and a deflection unit;
• a first arithmetic unit which calculates a main deflecting position based on main deflection distances in a main deflection area and which calculates a sum of the main deflection distances;
• a first storage section which stores the sum of the main deflection distances calculated by the first arithmetic unit;
• a second storage section which stores a correction table showing a relation between the sum of the main deflection distances and an output voltage of the deflection amplifier;
• a second arithmetic unit which calculates a correction coefficient of the main deflecting position from the sum of the main deflection distances stored in the first storage section and the correction table stored in the second storage section;
• and
• a third arithmetic unit which corrects the main deflecting position calculated by the first arithmetic unit by means of the correction coefficient calculated by the second arithmetic unit,
• wherein the deflection amplifier controls the deflection unit based on the main deflecting position corrected by the third arithmetic unit.

A deflection control device comprising:

• a first arithmetic unit which calculates a main deflecting position based on main deflection distances in a main deflection area and which calculates a sum of the main deflection distances;
• a first storage section which stores the sum of the main deflection distances calculated by the first arithmetic unit;
• a second storage section which stores a correction table showing a relation between the sum of the main deflection distances and an output voltage of a predetermined deflection amplifier;
• a second arithmetic unit which calculates a correction coefficient of the main deflecting position from the sum of the main deflection distances stored in the first storage section and the correction table stored in the second storage section;
• and
• a third arithmetic unit which corrects the main deflecting position calculated by the first arithmetic unit by means of the correction coefficient calculated by the second arithmetic unit.

An electron beam drawing method comprising:

• dividing drawing data into small areas;
• acquiring shot information in the respective small areas;
• preparing a correction table indicating a relation between the shot information and an output voltage of a deflection amplifier;
• correcting an output of the deflection amplifier based on the shot information and the table;
• and
• irradiating a sample surface with a beam based on the corrected output of the amplifier.

An electron beam drawing method comprising:

• dividing drawing data into small areas;
• acquiring shot information in the respective small areas;
• preparing a correction table indicating a relation between the shot information and position correction of the drawing data;
• correcting the drawing data based on the shot information and the correction table;
• and
• irradiating a sample surface with a beam based on the corrected drawing data.

A method of manufacturing a semiconductor device, comprising:

• calculating a main deflecting position based on main deflection distances in a main deflection area, and calculating a sum of the main deflection distances to store the sum;
• storing a correction table showing a relation between the sum of the main deflection distances and an output voltage of a predetermined deflection amplifier;
• calculating a correction coefficient of the main deflecting position from the stored sum of the main deflection distances and the stored correction table;
• correcting the calculated main deflecting position by means of the correction coefficient;
• and
• controlling a predetermined deflection unit based on the corrected main deflecting position, and irradiating a semiconductor substrate surface with a beam to manufacture the semiconductor device.

A method of manufacturing a semiconductor device, comprising:

• dividing drawing data into small areas;
• acquiring shot information in the respective small areas;
• preparing a correction table indicating a relation between the shot information and an output voltage of a deflection amplifier;
• correcting an output of the deflection amplifier based on the shot information and the table;
• and
• irradiating a semiconductor substrate surface with a beam based on the corrected output of the amplifier to thereby manufacture the semiconductor device.

An electron beam drawing program which allows a computer to execute:

• dividing drawing data into small areas;
• calculating a pattern density in each of the small areas to prepare a map in which there is described a relation between each small area and the pattern density;
• preparing a table constituted of a correction amount of a drawing position with respect to the pattern density;
• obtaining drawing data in which the drawing position of a pattern has been corrected based on the map and the table;
• and
• drawing the pattern on a sample surface based on the corrected drawing data.