Method for making mask in process of fabricating semiconductor device
AssigneeDongbuAnam Semiconductor Inc.
InventorMun-Hoe Do
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Abstract
A method for making a mask in a process of fabricating a semiconductor device is disclosed, in which one database is classified into an SRAM block and a random logic block so that OPC is separately performed for the SRAM block and the random logic block, thereby improving performance of the OPC. The method includes dividing an input database into an SRAM block and a random logic block, respectively performing optical proximity correction (OPC) for the SRAM block and the random logic block, and combining the SRAM block to the random logic block.
Claims11
A method for making a mask in a process of fabricating a semiconductor device comprising the step of:
- dividing an input database into an SRAM block and a random logic block;
- respectively performing optical proximity correction (OPC) for the SRAM block and the random logic block;
- and
- combining the SRAM block and the random logic block.
Dependencies are inferred from the claim text.