Resist composition and method of forming resist pattern using same
OwnerMasaru Takeshita, Miwa Miyairi +2inventors
InventorsMasaru Takeshita, Miwa Miyairi, Hideo Hada, Takeshi Iwai
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Abstract
There are provided a resist composition that produces a resist pattern of good shape, and a method of forming a resist pattern that uses such a resist composition. The resist composition comprises a resin component (A) that undergoes a change in alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (B) comprises a compound represented by a general formula (I) shown below [wherein, R1 to R3 each represent, independently, a methyl group or an ethyl group; and X− represents an anion].
Claims15
A resist composition comprising a resin component (A) that undergoes a change in alkali solubility under action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein
- said component (B) is a compound represented by a general formula (I) shown below:
- [wherein, R1 to R3 each represent, independently, a methyl group or an ethyl group;
- and X− represents an anion].
Dependencies are inferred from the claim text.