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US 2006/0141290 A1Published application
Titania coatings by cvd at atmospheric pressure
AssigneeSaint-Gobain Glass Grance
InventorsDavid Sheel, Martyn Pemble
Life of this patent
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Abstract
A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure CVD) with significantly higher substrate temperatures.
Claims25
1-24. (canceled)
A method for depositing titania, or titania-containing as thin films on a substrate, the method comprising:
- using an atmospheric pressure glow discharge plasma as a major source of reaction to improve film properties and film growth rates, when the substrate is heated at a temperature below 250° C.,
- introducing a reactive titania CVD precursor which has been pre-vaporised into the introduced gas flow into a gas flowing through a coating region.
A method according to claim 29, wherein a laminar flow is introduced into and through the coating region.
Dependencies are inferred from the claim text.