CVD apparatus and manufacturing method of semiconductor device using the same

Abstract

The present invention has been made in an effort to provide a CVD apparatus and a method of manufacturing a semiconductor device using the same having advantages of providing a precursor supplying apparatus that can prevent defects and/or contamination by source material-based contaminants that may result from certain operations performed during maintenance work. An exemplary precursor supplying apparatus for a CVD apparatus according to an embodiment of the present invention includes a precursor storage tank, a gas inlet line adapted to flow inert gas into the storage tank, a gas supply line connected to the storage tank and adapted to supply a precursor to a CVD chamber, and a backflow-prevention line connected to the gas inlet line and adapted to flow an inert gas into the storage tank and/or the gas inlet line.

Dependencies are inferred from the claim text.