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US 2006/0139613 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMartijn Houkes, Hans Butler, Henrikus Cox
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AssigneeASML Netherlands B.V.
InventorsMartijn Houkes, Hans Butler, Henrikus Cox
Estimating the term…
A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.
A system for use in a lithographic apparatus comprising:
10 The system of claim 9, wherein each of the first and second paths comprise a low pass filter.
A device manufacturing method comprising:
The method of claim 10, wherein the first element comprises a liquid supply system to arranged to contain a liquid to transfer a beam to the substrate held by the substrate table, a liquid removal system to remove a remainder of the liquid from the substrate, and a level sensor to measure a level of the substrate.
A computer program comprising machine executable instructions executable by a computer to perform a method of controlling a position quantity of a substrate table using a substrate table controller with respect to a first movable element, the first movable element being in contact with a surface of the substrate, the method comprising:
A lithographic apparatus comprising:
Dependencies are inferred from the claim text.