Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsRichard Bruls, Robertus Cornelis De Kruif
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Abstract
Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein there is provided a system for modifying the projection beam bandwidth distribution.
Claims20
A lithograpnic apparatus comprising:
- an illumination system for providing a beam of radiation;
- a support structure for supporting a patterning device, the patterning device serving to impart the beam of radiation with a pattern in its cross-section;
- a substrate table for holding a substrate;
- a projection system for projecting the beam of radiation after it has been patterned onto a target portion of the substrate;
- and
- a radiation controller, configured and arranged to cause an energy spectrum of the beam of radiation to be modified.
A device manufacturing method comprising:
- patterning a beam of radiation with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target portion of a substrate;
- and
- controlling an energy spectrum of the beam of radiation to change the energy spectrum thereby modifying image contrast.
Dependencies are inferred from the claim text.