Methods and systems for lithographic beam generation
AssigneeASML Netherlands B.V.
InventorsJohannes Baselmans, Anastasius Bruinsma, Pieter De Jager, Robert-Han Munnig Schmidt, Henri Vink
Life of this patent
Estimating the term…
Abstract
A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
Claims20
A lithographic apparatus, comprising:
- an illumination system that supplyies a projection beam of radiation;
- an array of individually controllable elements serving that imparts the projection beam with a pattern in its cross-section;
- a substrate table that holds a substrate;
- and
- a projection system that projects the patterned beam onto a target portion of the substrate;
- wherein the illumination system includes a beam delivery system having at least one radiation beam deflecting element and at least one radiation input that receives a plurality of source radiation beams from respective radiation sources, said at least one radiation beam deflecting element being arranged to deflect each of the received source radiation beams along a single common beam path, to provide said projection beam of radiation.
A method of projecting a pattern onto a substrate, comprising:
- receiving a plurality of source radiation beams from a plurality of corresponding radiation sources;
- deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation;
- imparting the projection beam of radiation with a cross-section pattern;
- and
- projecting the patterned projection beam of radiation onto a target portion of a substrate.
Dependencies are inferred from the claim text.