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AssigneeASML Netherlands B.V.
InventorsArnoud Wassink, Levinus Bakker, Johannes Moors, Frank Schuurmans
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A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.
A lithographic apparatus comprising:
An illumination system configured to condition a radiation beam, the illumination system comprising a filter system for filtering debris particles out of the radiation beam, wherein the filter system comprises (i) a plurality of foils for trapping the debris particles, (ii) a support for holding the plurality of foils, and (iii) a cooling system having a surface that is arranged to be cooled, the cooling system and the support being positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support, the cooling system further being arranged to inject gas into the gap.
A filter system for filtering debris particles out of a radiation beam that is usable for lithography, in particular EUV lithography, wherein the filter system comprises (i) a plurality of foils for trapping the debris particles, (ii) a support for holding the plurality of foils, and (iii) a cooling system having a surface that is arranged to be cooled, the cooling system and the support being positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support, the cooling system further being arranged to inject gas into the gap.
A method for cooling at least a support for foils of a filter system for filtering debris particles out of a radiation beam that is usable for lithography, the method comprising:
Dependencies are inferred from the claim text.