Mask superposition for multiple exposures
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorBurn Lin
Life of this patent
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Abstract
An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask. The exposure system also includes a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.
Claims21
An exposure system, comprising:
- a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask;
- and
- a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.
An exposure system, comprising:
- an L-shaped mask stage having a first arm and second arm being perpendicular to each other, adapted for holding a first mask on the first arm and a second mask on the second arm perpendicular to each other, the first mask configured for illumination by a first beam to form a first pattern, and the second mask configured for illumination by a second beam to form a second pattern;
- and
- a beam splitter configured next to the fist and second arms of the L-shaped mask stage, combining the first pattern and the second pattern to form a resultant pattern, wherein the resultant pattern is projected into a substrate coated with a photoresist layer.
Dependencies are inferred from the claim text.