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US 2006/0139602 A1Published application
Lithographic apparatus and device manufacturing method utilizing a multiple substrate carrier for flat panel display substrates
AssigneeASML Netherlands B.V.
InventorRobert-Han Munnig Schmidt
Life of this patent
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Abstract
A system and method allow for more than one substrate to be simultaneously moved and/or positioned on a support table. In one example, this is accomplished through use of a frame that either supports or separates one or more substrates for either transport or positioning on a support table. In another example, this is accomplished through use of spacers on a support table, which are used to properly position one or more substrates. In yet another example, this is accomplished through use of a robot placing one or more substrates on the support table.
Claims23
A lithographic apparatus, comprising:
- an illumination system, wherein the illumination system is arranged to generate a beam of radiation;
- a patterning system, wherein the patterning system is arranged to pattern the beam;
- a substrate table, wherein the substrate table is arranged to simultaneously hold a plurality of substrates;
- a projection system, wherein the projection system is arranged to project the patterned beam onto a target portion of a corresponding one of the plurality of substrates;
- and
- a substrate handler, wherein the substrate handler is arranged to move each of the plurality substrates relative to the substrate table and is arranged to singly or simultaneously carry the plurality of substrates.
3 more elements
A method, comprising:
- patterning a beam of radiation;
- projecting the patterned beam onto a target portion of each of a plurality of substrates simultaneously supported on a same support table;
- and
- singly or simultaneously moving each of the plurality of substrates between a handling device and the support table.
1 more element
Dependencies are inferred from the claim text.