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US 2006/0139601 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorJohannes Hoogenraad
Life of this patent
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Abstract
A lithographic apparatus has an array of individually controllable elements to impart a projection beam with a pattern in its cross-section. The projection system includes an array of lenses and an actuator configured to change the shape of the array of lenses. In one example, the actuator is a piezoelectric actuator
Claims7
A lithographic apparatus comprising:
- an illumination system that conditions a radiation beam;
- an array of individually controllable elements that pattern the beam;
- and
- a projection system that projects the patterned beam onto a target portion of a substrate, the projection system comprising,
- an array of lenses arranged in a plane, such that each lens in the array of lenses transmits a different part of the patterned beam, and
- an actuator system that controls an overall shape of the array of lenses.
3 more elements
A lithographic method, comprising:
- patterning a beam of radiation using an array of individually controllable elements;
- projecting the patterned beam onto a target portion of a substrate using at least an array of lenses arranged in a plane, such that each lens in the array of lenses transmits a different part of the patterned beam;
- and
- controlling an overall shape of the array of lenses using an actuator system, which sets the array of lenses to a required shape.
1 more element
Dependencies are inferred from the claim text.