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AssigneeASML Netherlands B.V.
InventorsStefan Kruijswijk, Marcel Mathijs Marie Dierichs, Markus Franciscus Eurlings, Heine Mulder
Estimating the term…
A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
A lithographic apparatus, comprising:
A lithographic apparatus, comprising:
A lithographic projection apparatus configured to project a patterned radiation beam onto a substrate, wherein the lithographic projection apparatus comprises an optical assembly comprising multiple optical elements two-dimensionally arranged in the radiation beam and configured to create a predetermined angular distribution of the radiation beam, the optical elements being selected from a predetermined number of optical elements having different shapes.
A lithographic apparatus, comprising:
An integrated device manufacturing method, comprising;
Dependencies are inferred from the claim text.