Exposure apparatus, exposure method and device manufacturing method
AssigneeNikon Corporation
InventorsHiroyuki Nagasaka, Yuuki Ishii, Susumu Makinouchi
Life of this patent
Estimating the term…
Abstract
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes; a liquid supply mechanism that supplies the liquid onto the substrate; a liquid recovery mechanism that recovers the liquid having been supplied on the substrate; and wherein when the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery mechanism does not perform the recover of the liquid.
Claims30
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of said projection optical system, exposes said substrate, the exposure apparatus comprising:
- a liquid supply mechanism that supplies the liquid onto said substrate;
- a liquid recovery mechanism that recovers the liquid having been supplied on said substrate;
- and wherein
- when said exposure light is being irradiated on the image plane side of said projection optical system, said liquid recovery mechanism does not perform the recover of said liquid.
An exposure apparatus according to clam 3, wherein
- the recovery of the liquid by said liquid recover mechanism in said period is performed every time the exposure of a predetermined number of shot areas is completed.
An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of said projection optical system, exposes said substrate, the exposure apparatus comprising:
- a substrate holding member that is movable while holding said substrate;
- a liquid recovery mechanism that has a recovery port above said substrate holding member and recovers the liquid on said substrate;
- and wherein
- after completion of exposure of the substrate held by said substrate holding member, said substrate holding member and said recovery port are relatively moved.
An exposure apparatus that by forming a liquid immersion region on a part of a substrate and by irradiating an exposure light to said substrate via the liquid forming the liquid immersion region and a projection optical system, exposes said state, the exposure apparatus comprising:
- a liquid supply mechanism that supplies, during the exposure of said substrate, the liquid onto said substrate;
- a liquid recovery mechanism that sucks and recovers, during the exposure of said substrate, the liquid on said substrate from above said substrate;
- and wherein
- during the exposure of said substrate, the liquid supply amount by said liquid supply mechanism is larger than the liquid recovery amount by said liquid recovery mechanism.
An exposure apparatus that by irradiating an exposure light to a substrate via a projection optical system and a liquid, exposes said substrate, the exposure apparatus
- a movable member that is placed on the image plane side of said projection optical system and holds the liquid between the movable member and said projection optical system;
- a liquid recovery mechanism that has a recovery port placed so as to face the surface of said movable member and is capable of recovering the liquid on said movable member;
- and wherein
- the liquid on said movable member is recovered, while relatively moving said movable member and the recovery port of said liquid recovery mechanism.
An exposure method that locally forms a liquid immersion region between the upper surface of a movable body that is movable while holding a substrate and a projection optical system, and by irradiating an exposure light on said substrate via said projection optical system and the liquid forming said liquid immersion region while moving said substrate relative to said exposure light, performs scanning exposure for each of a plurality of shot areas, wherein
- the moving speed of said substrate is determined in accordance with the position on said substrate of each of the plurality of shot areas.
An exposure method according to clam 26, wherein
- the moving speed of said substrate is determine based upon the size of the upper surface of said movable body and upon the size of said liquid immersion region.
Dependencies are inferred from the claim text.