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AssigneeASML Netherlands B.V.
InventorsRonald Kunst, Yin Tso, Youssef Maria De Vos, Ramidin Kamidi
Estimating the term…
A lithographic apparatus includes an illumination system for conditioning a radiation beam. A support structure supports a patterning device, which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table holds a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. A motion control system includes a controller having a transfer function. The controller controls a position of the support structure and or the substrate table along a series of positions. The transfer function consists of a sum of a plurality of positional transfer functions, each determined in one of the positions, and each multiplied by a weighing function.
A lithographic apparatus comprising:
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, comprising:
A device manufacturing method comprising:
A motion control system configured to control movement of a movable object, the system comprising:
Dependencies are inferred from the claim text.