Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsTammo Uitterdijk, Erik Loopstra, Laurens Sanderse
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Abstract
In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.
Claims24
A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final element having, on a surface nearest the substrate, a layer bonded to the surface and comprising an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid;
- and
- a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid.
A lithographic projection apparatus, comprising:
- a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final element having a layer on a surface nearest the substrate, the final element being attached to the apparatus through the layer;
- and
- a liquid supply system configured to at least partly fill a space between the final element of the projection system and the substrate with a liquid.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid provided in a space between a final element of a projection system and the substrate,
- wherein a surface of the final element nearest the substrate has a layer bonded to it and an edge barrier of the same material as the layer extends from the layer away from the substrate to shield the final element from the liquid.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a substrate through a liquid provided in a space between a final element of a projection system and the substrate, wherein the final element has on a surface nearest the substrate a layer through which the final element is supported.
Dependencies are inferred from the claim text.