Standard cell, standard cell library, semiconductor device, and placing method of the same

Abstract

Of a plurality of standard cells in which an N-well region and a P-well region are vertically formed, some standard cells have a border line between the N-well region and the P-well region which is set to be a low height (first height), and other standard cells have a border line between the N-well region and the P-well region which is set to be a high height (second height), depending on the size of a transistor formed in the standard cell. Although these standard cells have different border lines, a standard cell for linking the border lines is provided. In such a standard cell, an empty space is created by forming a small-size transistor therein, and the empty space is utilized so that, for example, a left end of the border line is set to have the first height and a right end of the border line is set to have the second height, whereby the border line is converted so as to link the heights therein.

Dependencies are inferred from the claim text.