Lithographic apparatus, illumination system and method for mitigating debris particles
AssigneeASML Netherlands B.V.
InventorMaarten Marinus Johannes Van Herpen
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Abstract
A lithographic apparatus includes a source for generating radiation bursts with a predetermined frequency, an illumination system for conditioning the radiation, a patterning device for patterning the radiation, and a projection system for projecting the patterned radiation onto a substrate. The illumination system includes a debris mitigating system for mitigating debris particles released with the generation of the radiation. The debris mitigating system is arranged to apply on the basis of the predetermined frequency a dynamically applicable condition to which the debris particles are exposed.
Claims33
A lithographic apparatus comprising:
- a source for generating radiation bursts with a predetermined frequency;
- an illumination system for conditioning the radiation;
- a patterning device for patterning the radiation;
- and
- a projection system for projecting the patterned radiation onto a substrate,
- wherein the illumination system comprises a debris mitigating system for mitigating debris particles released with the generation of the radiation, and
- wherein the debris mitigating system is arranged to apply on the basis of the predetermined frequency a dynamically applicable condition to which the debris particles are exposed.
An illumination system configured to condition radiation in a lithographic apparatus, the illumination system comprising a debris mitigating system for mitigating debris particles that are released when the radiation is generated, wherein the debris mitigating system is arranged to provide a dynamically applicable condition to which the debris particles are exposed on the basis of a predetermined frequency with which a source generates bursts of the radiation to be conditioned by the illumination system.
A method for mitigating debris particles released with the generation of radiation for use in lithography, wherein the method comprises applying a dynamic condition for mitigating the debris particles on the basis of a predetermined frequency with which bursts of the radiation are generated.
Dependencies are inferred from the claim text.