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US 2006/0138358 A1Published application
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJoeri Lof, Joannes De Smit
Life of this patent
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Abstract
A projection system comprises an array of lenses MLA, each lens transmitting a unique part of a patterned beam. Measuring devices measure a distance between the array of lenses MLA and a substrate W. A controller controls an actuator to adjust a position (e.g., height and/or tilt) of the microlens array MLA.
Claims17
A lithographic apparatus, comprising:
- an illumination system that conditions a radiation beam;
- an array of individually controllable elements that pattern the beam;
- a projection system that projects the patterned beam onto a target portion of a substrate and comprising an array of lenses arranged in a plane, such that each lens transmits a different part of the patterned beam;
- a measuring device that measures a distance between a part of the substrate and a part of the array of lenses;
- and
- an actuator that adjusts at least one of a position and a tilt of the array of lenses based on measurements by the measuring device.
3 more elements
A device manufacturing method, comprising:
- (a) patterning a beam of radiation using an array of individually controllable elements;
- (b) projecting the patterned beam onto a target portion of a substrate using a projection system;
- (c) arranging an array of lenses arranged in a plane of the projection system, such that each lens in the array of lenses transmits a different part of the patterned beam;
- (d) measuring a distance between the substrate and the array of lenses;
- and
- (e) adjusting at least one of position and tilt of the array of lenses based on the measured distance.
3 more elements
Dependencies are inferred from the claim text.