Lithographic apparatus, illumination system and method for mitigating debris particles

An illumination system configured to condition radiation in a lithographic apparatus, the illumination system comprising:

• a debris mitigating system for mitigating at least some debris particles that are released when the radiation is generated;
• and
• an optical system for collecting the radiation,
• wherein the debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from a source generating the radiation to the optical system.

A lithographic apparatus comprising:

• a source for generating radiation;
• an illumination system for conditioning the radiation;
• a patterning device for patterning the conditioned radiation;
• and
• a projection system for projecting the patterned radiation onto a substrate,
• wherein the illumination system comprises a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation, and
• wherein the debris mitigating system is constructed and arranged to mitigate the debris particles without use of another gas that is separate from the debris particles.

A lithographic apparatus comprising:

• a source for generating radiation;
• a debris mitigating system for mitigating debris particles that are released with the generation of radiation;
• an optical system for collecting the radiation,
• an illumination system for conditioning the radiation;
• a patterning device for patterning the conditioned radiation;
• and
• a projection system for projecting the patterned radiation onto a target portion of a substrate,
• wherein the debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.