Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
AssigneeASML Netherlands B.V.
InventorLevinus Bakker
Life of this patent
Estimating the term…
Abstract
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography is disclosed. The method includes providing a slack foil or wire for intercepting the particles, mounting at least a first point or side of the foil or wire to a first position of a mounting assembly, and substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.
Claims43
A method for providing an operable filter system for filtering particles out of a beam of radiation in lithography, the method comprising:
- providing a slack foil or wire for intercepting the particles;
- mounting at least a first point or side of the foil or wire to a first position of a mounting assembly;
- and
- substantially stretching the slack foil or wire at least within the beam of radiation, substantially parallel to a direction in which the radiation propagates.
A filter system for filtering particles out of a beam of radiation, the filter system being suited for use in lithography, the filter system comprising:
- a slack foil or wire for intercepting the particles,
- at least a first point or side of the foil or wire being mounted to a first position of a mounting assembly, and
- the slack foil or wire being arranged to be stretched substantially parallel to a direction in which the radiation propagates, at least within the beam of radiation.
An apparatus suited for use in lithography, the apparatus comprising:
- a radiation source,
- a processing system for processing the radiation from the radiation source, and
- a filter system for filtering particles out of radiation propagating from the radiation source towards the processing system through a predetermined cross section of the radiation as emitted by the radiation source, the filter system including a slack foil or wire for intercepting the particles, at least a first point or side of the foil or wire being mounted to a first position of a mounting assembly, the slack foil or wire being arranged to be stretched substantially parallel to a direction in which the radiation propagates, at least within the beam of radiation.
A lithographic apparatus comprising:
- a radiation system configured to condition a radiation beam, the radiation system including:
- (a) a radiation source,
- (b) a processing system for processing the radiation from the radiation source, and
- (c) a filter system for filtering particles out of radiation propagating from the radiation source towards the processing system through a predetermined cross section of the radiation as emitted by the radiation source, the filter system including a slack foil or wire for intercepting the particles, at least a first point or side of the foil or wire being mounted to a first position of a mounting assembly, the slack foil or wire being arranged to be stretched substantially parallel to a direction in which the radiation propagates, at least within the beam of radiation;
- and
- a projection system configured to project the radiation beam onto a substrate.
Dependencies are inferred from the claim text.