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US 2006/0138080 A1Published application
Stamper, lithographic method of using the stamper and method of forming a structure by a lithographic pattern
AssigneeHitachi, Ltd.
InventorsMitsuru Hasegawa, Akihiro Miyauchi
Life of this patent
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Abstract
A stamper includes a substrate and a plurality of protrusions of different heights formed on one of the surfaces of the substrate, the protrusions of larger height having a stack structure formed of at least two layers of at least two types of materials, thereby transferring a plurality of patterns at the same time.
Claims3
A method of transferring a pattern with a stamper, comprising the steps of:
- coating a resist on the surface of said stamper having protrusions;
- connecting said resist to the surface of an object substrate by pressing said resist against the surface of said object substrate;
- and
- forming said resist on the surface of said object substrate by removing said stamper.
1 more element
A method of forming a structure using a pattern transferred by a stamper, comprising:
- the step of forming a resist pattern having n physical steps (n:
- integer) on the surface of an object substrate by a stamper having a plurality of physical steps;
- and
- selected one of the step of etching the surface of at least a recessed area of said resist pattern where said object substrate is exposed, and the step of forming a first structural material on the surface of said recessed area of said resist pattern where said object substrate is exposed;
- the step of forming at least a new area of said resist pattern where said object substrate is exposed, by removing the resist of said resist pattern to the height of the first physical step from the surface of said object substrate;
- selected one of the step of etching the surface of at least a recessed area of said resist pattern where said object substrate is exposed, and the step of forming at least a new structural material on the surface of the recessed area of said resist pattern including the surface of the structural material formed the immediately preceding time;
- and
- forming at least a new area where the object substrate is exposed, by removing the resist to the height of the second physical step from the surface of said object substrate of said resist pattern;
- said step of forming at least a new area being repeated up to n times.
6 more elements
Dependencies are inferred from the claim text.