Substrate treating apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsKenichi Sano, Shuzo Nagami, Ichiro Mitsuyoshi, Takiyoshi Sakai
Life of this patent
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Abstract
A substrate treating apparatus includes a storage block for accommodating foups each storing a plurality of substrates, a first treating block for treating a plurality of substrates en bloc, a second treating block for treating one substrate at a time, and a transport device for transporting the substrates between the foups, first treating block and second treating block. The substrates may be treated in a mode of treating a plurality of substrates en bloc, and/or a mode of treating one substrate at a time.
Claims87
A substrate treating apparatus comprising:
- a receptacle table for supporting a receptacle that stores a plurality of substrates;
- a substrate treating block including a first treating section for treating a plurality of substrates en bloc, and a second treating section for treating the substrates one at a time;
- a transport mechanism for transporting the substrates between said receptacle table, said first treating section and said second treating section;
- and
- a control device for controlling, based on substrate treating conditions, a transport operation of said transport mechanism for transporting the substrates between said receptacle table, said first treating section and said second treating section.
A substrate treating apparatus comprising:
- a storage block for receiving a receptacle that stores a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- a second treating block for treating the substrates one at a time;
- and
- a transport block for transporting the substrates between said receptacle received in said storage block, said first treating block and said second treating block.
A substrate treating apparatus comprising:
- a receptacle table for supporting a receptacle that stores a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- a second treating block for treating the substrates one at a time;
- and
- a transport block for transporting the substrates between said receptacle placed on said receptacle table, said first treating block and said second treating block;
- wherein said second treating block is disposed between said first treating block and said receptacle table, and said transport block is disposed between said first treating block and said receptacle table and opposed to said second treating block.
A substrate treating apparatus comprising:
- a receptacle table for supporting a receptacle that stores a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- a second treating block for treating the substrates one at a time;
- and
- a transport block for transporting the substrates between said receptacle placed on said receptacle table, said first treating block and said second treating block;
- wherein said first treating block, said second treating block and said receptacle table are arranged in order along a long side of the substrate treating apparatus.
A substrate treating apparatus comprising:
- a storage block for receiving receptacles each storing a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- and
- a second treating block for treating the substrates one at a time;
- said storage block including:
- a first table for holding the receptacles for access from said first treating block;
- a second table for holding the receptacles for access from said second treating block;
- and
- a receptacle transport device for transporting the receptacles between said first table and said second table;
- wherein said first treating block includes a first transport mechanism for loading and unloading the substrates into/from the receptacles placed on said first table;
- and
- said second treating block includes a second transport mechanism for loading and unloading the substrates into/from the receptacles placed on said second table.
A substrate treating apparatus comprising:
- a storage block for receiving receptacles each storing a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- and
- a second treating block for treating the substrates one at a time;
- said storage block including:
- a first table for holding a receptacle for access from said first treating block;
- a second table for holding a receptacle for access from said second treating block;
- a third table for holding receptacles for access from outside said substrate treating apparatus;
- and
- a receptacle transport device for transporting the receptacles between said first table, said second table and said third table;
- wherein said first treating block includes a first transport mechanism for loading and unloading the substrates into/from a receptacle placed on said first table;
- and
- said second treating block includes a second transport mechanism for loading and unloading the substrates into/from a receptacle placed on said second table, and is disposed between said first treating block and said third table.
A substrate treating apparatus comprising:
- a storage block for receiving receptacles each storing a plurality of substrates;
- a first treating block for treating a plurality of substrates en bloc;
- and
- a second treating block for treating the substrates one at a time;
- said storage block including:
- a first table for holding a receptacle for access from said first treating block;
- a second table for holding a receptacle for access from said second treating block;
- and
- a receptacle transport device for transporting the receptacles between said first table and said second table;
- said first treating block including:
- a first transport mechanism for loading and unloading the substrates into/from a receptacle placed on said first table;
- and
- a batch treating section for treating with a solution or drying a plurality of substrates en bloc;
- wherein said second treating block includes a second transport mechanism for loading and unloading the substrates into/from a receptacle placed on said second table, and is disposed on an extension of a direction in which said batch treating section is arranged.
Dependencies are inferred from the claim text.