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US 2006/0137555 A1Published application
Imprint lithography
AssigneeASML Netherlands B.V.
InventorKlaus Simon
Life of this patent
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Abstract
An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
Claims24
An imprinting method, comprising:
- contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium;
- and
- separating the first and second templates from the imprinted medium.
A method for patterning a substrate, comprising:
- contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium, each imprint comprising a pattern feature and an area of reduced thickness;
- separating the first and second templates from the imprinted medium;
- etching the area of reduced thickness in the first and second target regions to expose predefined areas of the substrate;
- and
- etching the exposed predefined areas of the substrate.
2 more elements
An imprinting apparatus, comprising:
- substrate table configured to hold a substrate;
- and
- a template support configured to support first and second templates, the template support configured to cause the first and second templates to contact first and second spaced target regions respectively of an imprintable medium on the substrate to form respective first and second imprints in the medium and to cause the first and second templates to separate from the imprinted medium.
Dependencies are inferred from the claim text.