Method for manufacturing semiconductor device
OwnerMinoru Watanabeinventor
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Abstract
The present invention provides a method for manufacturing a semiconductor device, which includes a resist deposition step for forming a resist film on the surface of a semiconductor substrate provided with a plurality of chips disposed in matrix form, an exposure step for sequentially exposing chip patterns with respect to the respective chips in a predetermined exposure order from the chip set as a starting point of the semiconductor substrate, and a development step for developing the respective chips in the order opposite to the exposure order from the chip set as an end point in the exposure order.
Claims10
A method for manufacturing a semiconductor device, comprising the steps:
- a resist deposition step for forming a resist film on the surface of a semiconductor substrate provided with a plurality of chips disposed in matrix form;
- an exposure step for sequentially exposing chip patterns with respect to the respective chips in a predetermined exposure order from the chip set as a starting point of the semiconductor substrate;
- and
- a development step for developing the respective chips in the order opposite to the exposure order from the chip set as an end point in the exposure order.
A method for manufacturing a semiconductor device, comprising the steps:
- a resist deposition step for forming a resist film on the surface of a semiconductor substrate equipped with a plurality of chip rows disposed in matrix form in first and second directions orthogonal to each other;
- an exposure step for repeatedly exposing the respective chip rows in the second direction in parallel to one chip row in a predetermined exposure order from the one chip row set as a starting point in parallel to the first direction of the semiconductor substrate;
- and
- a development step for developing the respective chip rows in the second direction in the order opposite to the exposure order from one chip row set as an end point in parallel to the first direction in the exposure order.
Dependencies are inferred from the claim text.