Polymer for forming anti-reflective coating layer
AssigneeDongjin Semichem Co., Ltd.
InventorsSang-Jung Kim, Jong-Yong Kim, Deog-Bae Kim, Jae-Hyun Kim
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Abstract
A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by wherein, R1 is hydrogen or methyl group, and R2 is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-reflective coating layer includes the polymer having the repeating unit represented by above Formulas; a light absorber; and a solvent.
Claims10
A polymer for forming an organic anti-reflective coating layer comprising a repeating unit represented by the following Formula 1 or 2,
- wherein, R1 is hydrogen or methyl group,
- wherein, R2 is a substituted or non-substituted alky group of C1 to C5.
A composition for forming an organic anti-reflective coating layer comprising:
- a polymer including a repeating unit represented by Formula 1 or Formula 2;
- a light absorber;
- and a solvent.
Dependencies are inferred from the claim text.