Negative resist composition and process for formation of resist patterns
OwnerJyun Iwashita, Toshikazu Tachikawainventors
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Abstract
A negative resist composition includes a polymer having any one of dicarboxylate monoester compounds represented by the following general formulae (1) and (2) as a monomer component: wherein, R1 and R2 represent alkyl chains having 0 to 8 carbon atoms, R3 represents a substituent having at least two or more alicyclic structures, and R4 and R5 represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms. A method for forming a resist pattern uses the above negative resist composition. By containing the polymer, a resistance to dry etching and a resistance to electron beam from a scanning electron microscope (SEM) are enhanced as well as a solubility in an alkali developing solution is maintained.
Claims6
1-5. (canceled)
A negative resist composition comprising:
- a polymer having any one of dicarboxylate monoester compounds represented by the following general formulae (1) and (2) as a monomer component:
- wherein, R1 and R2 represent alkyl chains having 0 to 8 carbon atoms, R3 represents a substituent having at least two or more alicyclic structures, and R4 and R5 represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms;
- and
- an acid generator which generates an acid by receiving light irradiation.
A method of forming a resist pattern comprising the steps of:
- forming a photoresist film on a substrate using a negative resist composition;
- and
- forming a predetermined resist pattern on the substrate by applying an exposure treatment and a development treatment to the photoresist film,
- wherein said negative resist composition comprises:
- a polymer having any one of dicarboxylate monoester compounds represented by the following general formulae (1) and (2) as a monomer component:
- wherein, R1 and R2 represent alkyl chains having 0 to 8 carbon atoms, R3 represents a substituent having at least two or more alicyclic structures, and R4 and R5 represent hydrogen atoms or alkyl groups having 1 to 8 carbon atoms;
- and
- an acid generator which generates an acid by receiving light irradiation.
Dependencies are inferred from the claim text.