Photomask and method for maintaining optical properties of the same
OwnerLaurent Dieu, Joseph Gordon +2inventors
InventorsLaurent Dieu, Joseph Gordon, Eric Johnstone, Christian Chovino
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Abstract
A photomask and method for maintaining optical properties of the same are disclosed. The method includes providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface. A pattern is formed in the absorber layer to create a photomask for use in a semiconductor manufacturing process. A transmissive protective layer is also formed on at least one of the patterned layer and the second surface of the substrate. The protective layer reduces haze growth when the photomask is used in the semiconductor manufacturing process.
Claims24
A method for maintaining optical properties of a photomask, comprising:
- providing a substrate including a first surface having an absorber layer formed thereon and a second surface located opposite the first surface;
- forming a pattern in the absorber layer to create a photomask operable to be used in a semiconductor manufacturing process;
- and
- forming a transmissive protective layer on at least one of the patterned layer and the second surface of the substrate, the protective layer operable to prevent haze growth when the photomask is used in the semiconductor manufacturing process.
A method for maintaining optical properties of a photomask, comprising:
- providing a photomask blank including:
- a substrate having a first surface and a second surface located opposite the first surface;
- and
- an absorber layer formed on at least a portion of the first surface of the substrate;
- and
- forming a first protective layer on the second surface of the substrate, the protective layer operable to prevent haze growth on a photomask fabricated from the photomask blank when the photomask is used in a semiconductor manufacturing process.
A photomask, comprising:
- a patterned layer formed on at least a portion of a first surface of a substrate including a second surface opposite the first surface;
- and
- a protective layer formed on at least one of the patterned layer and second surface of the substrate, the protective layer operable to prevent haze growth when the photomask is used in a semiconductor manufacturing process.
Dependencies are inferred from the claim text.