Optimization to avoid sidelobe printing
AssigneeASML Netherlands B.V.
InventorSteven Hansen
Life of this patent
Estimating the term…
Abstract
A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate; and determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.
Claims50
A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the method comprising:
- calculating a size of a printed sidelobe generated as a result of optical transfer of the mask pattern onto the substrate;
- and
- determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.
A computer program product having machine-executable instructions, said instructions executable by a machine to perform a method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the method comprising:
- calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate;
- and
- determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.
A lithographic projection apparatus, comprising:
- a support structure configured to support a patterning device which can be used to pattern a beam of radiation according to a desired pattern;
- a substrate table configured to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a processor configured to calculate a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate, to determine a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size, and to determine an illumination shape based on the determined plurality of lithographic parameters;
- and
- a selectably variable beam controller that is adapted to modify a cross-sectional intensity distribution in the beam of radiation, before the beam of radiation reaches the patterning device, in accordance with the illumination shape determined by the processor.
A computer program product having machine-executable instructions, said instructions executable by a machine to perform a method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the method comprising:
- instructing a simulator to determine a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate, the optical transfer of the mask pattern being calculated with a simulation model of said simulator;
- and
- instructing the simulator to iteratively run the simulation model to determine the best conditions for obtaining a high latitude for the mask pattern with a small printed sidelobe size.
A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus, the method comprising:
- determining an intensity of radiation associated with a sidelobe that is generated as a result of the optical transfer of the mask pattern onto the substrate, and
- determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a radiation intensity associated with said sidelobe below a threshold printing value.
Dependencies are inferred from the claim text.