Systems and methods for depositing material onto microfeature workpieces

A system for depositing materials onto a microfeature workpiece, the system comprising:

• a first deposition chamber;
• a second deposition chamber operably coupled to the first deposition chamber, the second deposition chamber including (a) an energy source configured to generate a plasma energy and direct the plasma energy toward a first zone in the second deposition chamber, (b) a window between the energy source and the first zone to transmit the plasma energy from the energy source to the first zone, and (c) a barrier configured to selectively control the movement of ions from the first zone to a second zone in the second deposition chamber;
• a gas supply assembly having a first gas source in fluid communication with the first deposition chamber and a second gas source in fluid communication with the second deposition chamber;
• and
• a workpiece support movable between the first and second deposition chambers.

A system for depositing materials onto a microfeature workpiece, the system comprising:

• a first deposition chamber;
• a second deposition chamber including (a) means for generating a plasma energy and directing the plasma energy toward a first zone in the second deposition chamber, and (b) means for selectively controlling the flow of ions from the first zone to a second zone in the second deposition chamber;
• a third chamber between the first and second deposition chambers;
• a gas supply assembly having (a) a first gas source in fluid communication with the first deposition chamber, (b) a second gas source in fluid communication with the second deposition chamber, (c) a third gas source in fluid communication with the second deposition chamber, and (d) a fourth gas source in fluid communication with the third deposition chamber;
• and
• means for transferring the microfeature workpiece between the first and second deposition chambers.

A reactor for depositing material onto a microfeature workpiece, the reactor comprising:

• a reaction chamber;
• a workpiece support in the reaction chamber;
• an energy source configured to generate a plasma energy and direct the plasma energy toward a plasma zone in the reaction chamber;
• a window transmissive of the plasma energy between the energy source and the plasma zone;
• and
• a barrier in the reaction chamber between the workpiece support and the window, the barrier dividing the plasma zone into a first zone between the window and the barrier and a second zone between the workpiece support and the barrier, the barrier being configured to selectively control the flow of ions from the first zone to the second zone.

A method for depositing material onto a microfeature workpiece, comprising:

• depositing molecules of a first gas onto the microfeature workpiece in a first deposition chamber;
• generating a steady-state plasma in a second deposition chamber;
• and
• depositing molecules of a second gas onto the first gas molecules on the workpiece in the second deposition chamber while generating the steady-state plasma.

A method for depositing material onto a microfeature workpiece, comprising:

• depositing molecules of a first gas onto the microfeature workpiece in a first deposition chamber;
• moving the microfeature workpiece from the first deposition chamber to a second deposition chamber spaced apart from the first deposition chamber after depositing the first gas molecules;
• generating a plasma in the second deposition chamber;
• selectively urging at least a portion of the plasma toward the microfeature workpiece in the second deposition chamber;
• and
• depositing molecules of a second gas onto the microfeature workpiece in the second deposition chamber.

A method for depositing material onto a microfeature workpiece, comprising:

• depositing molecules of a first gas onto the microfeature workpiece in a first deposition chamber;
• flowing a second gas into a second deposition chamber spaced apart from the first deposition chamber;
• generating a plasma from the second gas in the second deposition chamber while depositing the first gas molecules;
• positioning the microfeature workpiece in the second chamber after depositing molecules of the first gas;
• and
• depositing molecules of a third gas onto the microfeature workpiece in the second chamber while generating the plasma in the second chamber.

A method for depositing material onto a microfeature workpiece, comprising:

• depositing molecules of a first gas onto the microfeature workpiece in a first deposition chamber;
• generating a plasma in a first zone of a second deposition chamber;
• electrically charging a barrier to urge at least a portion of the plasma from the first zone toward a second zone in the second deposition chamber adjacent to the microfeature workpiece;
• and
• depositing molecules of a second gas onto the microfeature workpiece in the second deposition chamber.