Lithography method
OwnerBenjamin Szu-Min Lininventor
Life of this patent
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Abstract
A lithography method for improving contrast includes the following steps: To provide a light source. To provide a first plate including at least one opening rotates according to at least one angular velocity. To provide a mask having patterns on it. To provide a second plate including at least one block corresponding to the opening rotates according to the same angular velocity as the first plate. The method also includes a step to perform an exposure process such that zero order light diffracted by the mask is hindered by the block.
Claims30
A lithography method for improving contrast comprising eliminating zero order light by utilizing a first plate in conjunction with a matching second plate.
A lithography method for improving contrast comprising the following steps:
- providing a light source;
- providing a first plate comprising a plurality of concentric ring-shaped regions by taking a center of the first plate as center points, each of the ring-shaped regions comprising at least one opening, the opening in each of the ring-shaped regions being interlaced with the opening in each other ring-shaped region, and the first plate rotating according to at least one angular velocity;
- providing a mask having patterns on it;
- providing a second plate comprising a plurality of blocks corresponding to the openings, and the second plate rotating according to the same angular velocity as the first plate;
- and
- performing an exposure process such that zero order light diffracted by the mask is hindered by the blocks.
A lithography method for improving contrast comprising the following steps:
- providing a light source;
- providing a first plate comprising a ring-shaped region by taking a center of the first plate as a center point, the ring-shaped region comprising at least one opening, and the first plate rotating according to at least one angular velocity;
- providing a mask having patterns on it;
- providing a second plate comprising at least one block corresponding to the opening, and the second plate rotating according to the same angular velocity as the first plate;
- and
- performing an exposure process such that zero order light diffracted by the mask is hindered by the block.
Dependencies are inferred from the claim text.