Lithographic apparatus and device manufacturing method utilizing an microlens array at a image plane
AssigneeASML Netherlands B.V.
InventorsJohannes Baselmans, Huibert Visser
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Abstract
A lithographic apparatus includes a radiation system, a patterning device, and a projection system. The patterning device patterns a beam of radiation from the radiation system. The projection system projects the patterned beam onto a target portion of a substrate. The projection system comprising a pupil positioned at a pupil plane of the projection system and an array of lenses positioned at an image plane of the projection system. The patterning device is conjugate to the array of lenses and the pupil is conjugate to the substrate.
Claims18
A lithographic apparatus, comprising:
- a radiation system that provides a beam of radiation;
- a patterning device that patterns the beam;
- and
- a projection system that projects the patterned beam onto a target portion of a substrate, the projection system comprising,
- a pupil stop positioned at a pupil plane of the projection system, and
- an array of lenses positioned at an image plane of the projection system,
- wherein the patterning device is conjugate to the array of lenses, and
- wherein the pupil stop is conjugate to the substrate, the substrate being spaced from the image plane.
A device manufacturing method, comprising:
- patterning a beam of radiation using a patterning device;
- directing the patterned beam onto a microlens array in a projection system, the microlens array being positioned conjugate to the patterning device;
- forming a plurality of segments of the pattern beam, each segment being formed using a respective lens in the microlens array;
- and
- projecting a Fourier transform of each of the segments of the patterned beam onto a target portion of a substrate.
A method, comprising:
- positioning a patterning device at an object plane of a projection system;
- positioning a microlens array at an image plane of the projection system, which is conjugate to the patterning device at the object plane;
- and
- positioning a workpiece conjugate to a pupil plane of the projection system,
- wherein a beam of radiation is patterned using the patterning device, and
- wherein the patterned beam is projected onto a target portion of the workpiece using the projection system.
Dependencies are inferred from the claim text.