Optical element for an illumination system
AssigneeCarl Zeiss SMT GmbH
InventorsWolfgang Singer, Martin Antoni
Life of this patent
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Abstract
There is provided an optical element for an illumination system for wavelengths of ≦193 nm. The illumination sytem includes a light source, a field plane, an exit pupil, and a plurality of facets. The plurality of facets receives light from the light source and guides the light to a plurality of discrete points in the field plane. The plurality of discrete points collectively illuminate a field in the field plane, and each of the plurality of facets illuminates a region of the exit pupil.
Claims49
An optical element for an illumination system for wavelengths of ≦193 nm, comprising:
- a light source;
- a field plane;
- an exit pupil;
- and
- a plurality of facets,
- wherein said plurality of facets receives light from said light source and guides said light to a plurality of discrete points in said field plane,
- wherein the plurality of discrete points collectively illuminate a field in said field plane, and
- wherein each of said plurality of facets illuminates a region of said exit pupil.
An illumination system for wavelengths of ≦193 nm, comprising:
- light source;
- a field plane;
- an optical element;
- and
- an exit pupil,
- wherein said plurality of facets receives light from said light source and guides said light to a plurality of discrete points in said field plane,
- wherein the plurality of discrete points collectively illuminate a field in said field plane, and
- wherein each of said plurality of facets illuminates a region of said exit pupil.
An illumination system for wavelengths of ≦193 nm, wherein the illumination system has only one facetted optical element in the beam path from a light source or an image of a light source to a field plane, which facetted optical element both images the light source or the image of the light source in to a field plane of the illumination system and also illuminates a pupil of the illumination system.
An illumination system for wavelengths of ≦193 nm, wherein the illumination system has only one facetted optical element in the beam path from a light source or an image of a light source to a field plane, which facetted optical element both images the light source or an image of the light source into a field plane of the illumination system and also illuminates a pupil of the illumination system and has only a single additional mirror.
An illumination system for wavelengths of ≦193 nm, wherein the illumination system comprises:
- only one facetted optical element;
- and
- at least one grazing-incidence mirror.
An illumination system for wavelength ≦193 nm, comprising one facetted optical element that illuminates a exit pupil of the illumination system without an imaging optical elements.
An illumination system for wavelengths ≦193 nm, comprising a facetted optical element with more than 1000 facets.
An illumination system for wavelengths ≦193 nm, comprising a facetted optical element having a shape that substantially coincides to a field shape of a field to be illuminated in a field plane.
An illumination system for wavelengths ≦193 nm, comprising a facetted optical element having a plurality of facets, wherein each facet illuminates a plurality of discrete field points and pupil sites.
A projection exposure unit for wavelength of ≦193 nm, comprising:
- an illumination system having a facetted optical element having more than 1000 facets;
- and
- a projection objective having an entrance pupil, wherein said entrance pupil is real.
A projection exposure unit for wavelength of ≦193 nm, comprising:
- an illumination system having a facetted optical element having more than 1000 facets;
- and
- a projection objective having an entrance pupil, wherein said entrance pupil is virtual.
A projection exposure unit for wavelength of ≦193 nm, comprising:
- an illumination system having only one facetted optical element;
- and
- a projection objective having an entrance pupil, wherein said entrance pupil is real.
A projection exposure unit for wavelength of ≦193 nm, comprising:
- an illumination system having one facetted optical element;
- and
- a projection objective having an entrance pupil, wherein said entrance pupil is virtual.
Dependencies are inferred from the claim text.