Lithographic apparatus and device manufacturing method utilizing hexagonal image grids
AssigneeASML Netherlands B.V.
InventorsJohannes Baselmans, Patricius Tinnemans, Willem Venema
Life of this patent
Estimating the term…
Abstract
An apparatus and system that form a hexagonal exposed spot grid on a substrate. This is accomplished by using a patterning device that directs a patterned beam onto a microlens array, which forms Fourier transformed spots of the pattered beam at the substrate. Through at least one of (a) moving of the substrate that is patterned by the patterning device and/or changing a frequency of a beam of radiation or (b) through a hexagonal configuration of the patterning device and the microlens array, the spots from the microlens array form the hexagonal exposed spot grid on the substrate.
Claims18
A system, comprising:
- a source of radiation that produces a beam of radiation;
- a patterning device that patterns the beam;
- and
- a projection system that projects the patterned beam onto a target portions of a substrate, the projection system including a microlens array positioned proximate the substrate and configured to form a substantially hexagonal grid pattern on the substrate.
A method, comprising:
- patterning a beam of radiation from a source of radiation using a patterning device;
- projecting the patterned beam onto a target portions of a substrate using a projection system;
- and
- forming a substantially hexagonal grid pattern on the substrate using a microlens array in the projection system that is positioned proximate the substrate.
Dependencies are inferred from the claim text.