Lithographic apparatus with autofocus system
AssigneeASML Netherlands B.V.
InventorsUwe Mickan, Antonius Van Dijsseldonk
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AssigneeASML Netherlands B.V.
InventorsUwe Mickan, Antonius Van Dijsseldonk
Estimating the term…
A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a position sensitive detector, and a light directing arrangement for directing a first portion of light from the light source to the position sensitive detector. The light directing arrangement further directs a second portion of light from the light source into the projection system and, after the second portion of light has traveled through the projection system to the substrate and back through the projection system to the light directing arrangement, the second portion of light is directed onto the position sensitive detector.
A lithographic apparatus having an illumination system for providing a radiation beam, a patterning device for imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a substrate table constructed to hold a substrate, the lithographic apparatus comprising:
A method of focusing a beam of radiation onto a substrate in a lithographic apparatus that includes an illumination system for providing the radiation beam, a patterning device for imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold the substrate, and a projection system having a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate, the method comprising:
The method according to claim 17, wherein the first portion of light from the light source follows a same path through the projection system as the radiation beam produced by the illumination system.
A lithographic apparatus having an illumination system for providing a radiation beam, a patterning device for imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a substrate table constructed to hold a substrate, the lithographic apparatus comprising:
Dependencies are inferred from the claim text.