Liquid immersion type exposure apparatus
OwnerToshinobu Tokitainventor
Life of this patent
Estimating the term…
Abstract
Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
Claims15
An exposure apparatus, comprising:
- a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;
- a supplying system for supplying a liquid medium;
- a collecting system for collecting a liquid medium;
- and
- an exhausting system for removing a bubble in the liquid medium between the substrate and said optical element through a porous material.
An exposure apparatus, comprising:
- a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;
- a supplying system for supplying a liquid medium through a first porous material;
- and
- a collecting system for collecting a liquid medium through a second porous material,
- wherein a surface of said first porous material disposed opposed to the substrate and a surface of said second porous material disposed opposed to the substrate are maintained at the same level with respect to the substrate.
An exposure apparatus, comprising:
- a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;
- and
- a collecting system for collecting a fluid through a porous material, said collecting system including a holding member for holding the porous material;
- wherein a surface of the porous material disposed opposed to the substrate and a surface of said holding member are maintained at the same level with respect to the substrate.
Dependencies are inferred from the claim text.