Exposure apparatus and device manufacturing method
AssigneeNikon Corporation
InventorShigeru Hirukawa
Life of this patent
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Abstract
A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid, and a measurement device is configured to obtain a pressure of liquid in the space.
Claims12
A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
- a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
- a substrate table configured to hold a substrate;
- a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid;
- and
- a measurement device configured to obtain a pressure of liquid in the space.
A device manufacturing method comprising:
- providing a liquid to at least partly fill a space between an object on a substrate table of a lithographic apparatus and a projection system of the lithographic apparatus;
- obtaining the pressure of liquid in the space;
- and
- projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of a substrate.
An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising:
- a source emitting electromagnetic radiation onto an object plane;
- a mask arranged at said object plane to relay said electromagnetic radiation toward said work piece;
- and
- an immersion medium contacting at least a portion of an immersion optics of said lithographic system and a portion of said work piece, wherein said immersion medium is supplied through at least one orifice arranged in said immersion optics.
An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, comprising:
- a source emitting electromagnetic radiation onto an object plane;
- a mask adapted to receive and modulate said electromagnetic radiation at said object plane and to relay said electromagnetic radiation toward said work piece;
- and
- an immersion medium contacting at least a portion of a final lens of said lithographic system and a portion of said work piece, wherein an area of said contacting is restricted by capillary forces.
Dependencies are inferred from the claim text.