Exposure apparatus, exposure method, and method for producing device

An exposure apparatus which exposes a substrate by illuminating a pattern of a mask with an exposure beam and transferring an image of the pattern through a liquid onto the substrate, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• and
• a liquid immersion unit which fills, with the liquid, at least a part of a space between the projection optical system and the substrate, wherein:
• the liquid flows as a laminar flow in parallel to a scanning direction of the substrate.

An exposure apparatus which exposes a substrate by illuminating a pattern with an exposure beam and transferring an image of the pattern through a liquid onto the substrate, the exposure apparatus comprising:

• a projection optical system which projects the image of the pattern onto the substrate;
• a liquid immersion unit which supplies the liquid onto only the substrate;
• and
• a control unit which controls the liquid immersion unit, wherein:
• the control unit controls the liquid immersion unit so that the supply of the liquid is stopped during the exposure of the substrate.