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AssigneeASML Netherlands B.V.
InventorsHans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Cornelis Hoeven, Cedric Grouwstra
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A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
A lithographic apparatus, comprising:
A lithographic apparatus, comprising:
The use of a fluid supply system in a lithographic apparatus for the in-line application of (i) a cleaning fluid, (ii) a coating fluid, (iii) a coating remover, or (iv) any combination of (i)-(iii), to a space between a projection system and a substrate table of the lithographic apparatus.
A spray unit configured to spray a cleaning fluid onto a final optical element of a lithographic apparatus projection system.
An ultrasonic emitter configured to turn a liquid confined in a space between a projection system and a substrate table of lithographic apparatus into an ultrasonic cleaning liquid.
A method of cleaning a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a cleaning fluid through the space.
A method of coating a projection system optical element, a substrate table, or both, in a lithographic apparatus configured to have a liquid in a space between the optical element and the substrate table, the method comprising circulating a coating fluid through the space.
Dependencies are inferred from the claim text.