System and method for patterning both sides of a substrate utilizing imprint lithography
AssigneeASML Holding N.V.
InventorHarry Sewell
Life of this patent
Estimating the term…
Abstract
Provided are a method and system for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. A method includes deforming the surfaces of the first and second imprint stamps to produce respective first and second deformed surfaces, each having an arc therein. A Pressure is applied to bring the deformed first and second surfaces into intimate contact with the first and second substrate surfaces, respectively. The applied pressure substantially flattens the deformed surfaces. And to separate the two surfaces, the applied pressure is released.
Claims28
A method for providing patterns formed on surfaces of first and second imprint stamps onto first and second surfaces of a substrate, the method comprising:
- (a) deforming at least one of the surfaces of the first and second imprint stamps to produce a deformed surface;
- (b) bringing the deformed surface into contact with one of the first and second substrate surfaces for transferring the pattern to the one of the first and second substrate surface;
- and
- (c) releasing the deformed surface from the the one of the first and second substrate surface.
An apparatus for providing patterns formed on first and second surfaces of first and second imprint stamps onto first and second sides of a substrate, the apparatus comprising:
- a deforming device for deforming at least one of the first and second imprint stamps to become a deformed surface;
- and
- a moving device for moving the deformed surface against one of the first and second sides of the substrate so that the pattern is transferred to the one of the first and second sides of the substrate.
A system, comprising:
- a substrate having first and second patterning surfaces and a shaped edge;
- a carrier having a holding portion that holds the shaped edge of the substrate, the holding surface having a shape that is complementary to the shaped edge of the substrate, such that the patterning surfaces remain untouched by the carrier;
- and
- first and second imprint stamps that form patterns on respective ones of the first and second patterning surfaces.
A system, comprising:
- a substrate having first and second patterning surfaces and a shaped edge;
- and
- a carrier having a holding portion that holds the shaped edge of the substrate, the holding surface having a shape that is complementary to the shaped edge of the substrate, such that the patterning surfaces remain untouched by the carrier.
A method, comprising:
- transporting a substrate having first and second patterning surfaces and a shaped edge using a carrier having a holding portion that holds the shaped edge of the substrate, the holding surface having a shape that is complementary to the shaped edge of the substrate, such that the patterning surfaces remain untouched by the carrier;
- and
- forming respective first and second patterns on respective first and second sides of the substrate using first and second imprint stamps.
Dependencies are inferred from the claim text.